Hexamethyldisiloxane (HMDSO)

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Hexamethyldisiloxane is a volatile linear siloxane compound containing two trimethylsilyl groups linked by an oxygen atom. It serves as an important intermediate, solvent, and surface treatment agent in silicone chemistry, coatings, and electronic applications. HMDSO provides excellent thermal stability, low surface tension, and hydrophobicity, making it ideal for use in formulations requiring surface modification and film uniformity.

It is commonly used as a precursor in plasma-enhanced chemical vapor deposition (PECVD) processes for producing silicon oxide or silicon dioxide films, as well as a carrier fluid and cleaning agent in high-purity applications.

Key Features:

  • Excellent thermal and chemical stability

  • Low surface tension for improved wetting and flow properties

  • Provides hydrophobic and release characteristics on treated surfaces

  • Suitable for high-purity and electronic applications

Applications:

  • Semiconductor and display manufacturing (PECVD precursor)

  • Solvent and cleaning agent in electronics and optics

  • Intermediate in silicone and siloxane synthesis

  • Surface modifier and water-repellent treatment

CAS # 107-46-0

Hexamethyldisiloxane is a volatile linear siloxane compound containing two trimethylsilyl groups linked by an oxygen atom. It serves as an important intermediate, solvent, and surface treatment agent in silicone chemistry, coatings, and electronic applications. HMDSO provides excellent thermal stability, low surface tension, and hydrophobicity, making it ideal for use in formulations requiring surface modification and film uniformity.

It is commonly used as a precursor in plasma-enhanced chemical vapor deposition (PECVD) processes for producing silicon oxide or silicon dioxide films, as well as a carrier fluid and cleaning agent in high-purity applications.

Key Features:

  • Excellent thermal and chemical stability

  • Low surface tension for improved wetting and flow properties

  • Provides hydrophobic and release characteristics on treated surfaces

  • Suitable for high-purity and electronic applications

Applications:

  • Semiconductor and display manufacturing (PECVD precursor)

  • Solvent and cleaning agent in electronics and optics

  • Intermediate in silicone and siloxane synthesis

  • Surface modifier and water-repellent treatment

CAS # 107-46-0