Hexamethyldisilazane is a silylating and surface treatment agent widely used in the semiconductor, coatings, and polymer industries. It contains two trimethylsilyl groups linked by a nitrogen atom, providing excellent hydrophobicity and reactivity toward hydroxyl-containing surfaces and compounds.
HMDS reacts with moisture or surface hydroxyl groups to replace active hydrogen atoms with trimethylsilyl groups, resulting in enhanced moisture resistance, surface uniformity, and organic compatibility. It is also a key precursor and reagent in silicone synthesis and organosilane modification.
Key Features:
Excellent silylation agent for surface modification and chemical synthesis
Improves adhesion and hydrophobicity on oxide and glass surfaces
Enhances moisture and thermal stability in treated substrates
Volatile and easy to handle in vapor-phase and liquid applications
Applications:
Surface treatment in semiconductor and electronic manufacturing
Adhesion promoter and primer for photoresists
Intermediate for silicone and silazane synthesis
Water-repellent and release agent for glass and ceramics
CAS # 999-97-3
Hexamethyldisilazane is a silylating and surface treatment agent widely used in the semiconductor, coatings, and polymer industries. It contains two trimethylsilyl groups linked by a nitrogen atom, providing excellent hydrophobicity and reactivity toward hydroxyl-containing surfaces and compounds.
HMDS reacts with moisture or surface hydroxyl groups to replace active hydrogen atoms with trimethylsilyl groups, resulting in enhanced moisture resistance, surface uniformity, and organic compatibility. It is also a key precursor and reagent in silicone synthesis and organosilane modification.
Key Features:
Excellent silylation agent for surface modification and chemical synthesis
Improves adhesion and hydrophobicity on oxide and glass surfaces
Enhances moisture and thermal stability in treated substrates
Volatile and easy to handle in vapor-phase and liquid applications
Applications:
Surface treatment in semiconductor and electronic manufacturing
Adhesion promoter and primer for photoresists
Intermediate for silicone and silazane synthesis
Water-repellent and release agent for glass and ceramics
CAS # 999-97-3