Hexamethyldisilazane (HMDZ or HMDS)

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Hexamethyldisilazane is a silylating and surface treatment agent widely used in the semiconductor, coatings, and polymer industries. It contains two trimethylsilyl groups linked by a nitrogen atom, providing excellent hydrophobicity and reactivity toward hydroxyl-containing surfaces and compounds.

HMDS reacts with moisture or surface hydroxyl groups to replace active hydrogen atoms with trimethylsilyl groups, resulting in enhanced moisture resistance, surface uniformity, and organic compatibility. It is also a key precursor and reagent in silicone synthesis and organosilane modification.

Key Features:

  • Excellent silylation agent for surface modification and chemical synthesis

  • Improves adhesion and hydrophobicity on oxide and glass surfaces

  • Enhances moisture and thermal stability in treated substrates

  • Volatile and easy to handle in vapor-phase and liquid applications

Applications:

  • Surface treatment in semiconductor and electronic manufacturing

  • Adhesion promoter and primer for photoresists

  • Intermediate for silicone and silazane synthesis

  • Water-repellent and release agent for glass and ceramics

CAS # 999-97-3

Hexamethyldisilazane is a silylating and surface treatment agent widely used in the semiconductor, coatings, and polymer industries. It contains two trimethylsilyl groups linked by a nitrogen atom, providing excellent hydrophobicity and reactivity toward hydroxyl-containing surfaces and compounds.

HMDS reacts with moisture or surface hydroxyl groups to replace active hydrogen atoms with trimethylsilyl groups, resulting in enhanced moisture resistance, surface uniformity, and organic compatibility. It is also a key precursor and reagent in silicone synthesis and organosilane modification.

Key Features:

  • Excellent silylation agent for surface modification and chemical synthesis

  • Improves adhesion and hydrophobicity on oxide and glass surfaces

  • Enhances moisture and thermal stability in treated substrates

  • Volatile and easy to handle in vapor-phase and liquid applications

Applications:

  • Surface treatment in semiconductor and electronic manufacturing

  • Adhesion promoter and primer for photoresists

  • Intermediate for silicone and silazane synthesis

  • Water-repellent and release agent for glass and ceramics

CAS # 999-97-3